AN OPTICS FREE SPECTROMETER FOR THE EXTREME-ULTRAVIOLET

被引:4
|
作者
JUDGE, DL
DAYBELL, MD
HOFFMAN, JR
GRUNTMAN, MA
OGAWA, HS
SAMSON, JAR
机构
[1] UNIV SO CALIF,DEPT PHYS & ASTRON,LOS ANGELES,CA 90089
[2] UNIV NEBRASKA,DEPT PHYS,LINCOLN,NE 68588
[3] UNIV SO CALIF,CTR SPACE SCI,LOS ANGELES,CA 90089
基金
美国国家航空航天局;
关键词
D O I
10.1016/0168-9002(94)91930-5
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The optics-free spectrometer is a photon spectrometer. It provides the photon spectrum of a broadband source by converting energy E into electrons of energy E', according to the Einstein relation, E' = E - E(i). E(i) is the ionization threshold of the gas target of interest (any of the rare gases are suitable) and E is the incoming photon energy. As is evident from the above equation, only a single order spectrum is produced throughout the energy range between the first and second ionization potentials of the rare gas used. Photons with energy above the second ionization potential produce two groups of electrons, but they are readily distinguished from each other. This feature makes this device extremely useful for determining the true spectrum of a continuum source or a many line source. The principle of operation and the laboratory results obtained with a representative configuration of the optics-free spectrometer are presented.
引用
收藏
页码:472 / 474
页数:3
相关论文
共 50 条
  • [31] HINODE/EXTREME-ULTRAVIOLET IMAGING SPECTROMETER OBSERVATIONS OF THE TEMPERATURE STRUCTURE OF THE QUIET CORONA
    Brooks, David H.
    Warren, Harry P.
    Williams, David R.
    Watanabe, Tetsuya
    ASTROPHYSICAL JOURNAL, 2009, 705 (02): : 1522 - 1532
  • [32] Achromatic Fresnel optics for wideband extreme-ultraviolet and X-ray imaging
    Yuxin Wang
    Wenbing Yun
    Chris Jacobsen
    Nature, 2003, 424 : 50 - 53
  • [33] Multilayer coatings of 10X projection optics for extreme-ultraviolet lithography
    Montcalm, C
    Spiller, E
    Wedowski, M
    Gullikson, EM
    Folta, JA
    EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 710 - 716
  • [34] Design of an extreme-ultraviolet monochromator free from temporal stretching
    Norin, J
    Osvay, K
    Albert, F
    Descamps, D
    Yang, JJ
    L'Huillier, A
    Wahlström, CG
    APPLIED OPTICS, 2004, 43 (05) : 1072 - 1081
  • [35] Achromatic Fresnel optics for wideband extreme-ultraviolet and X-ray imaging
    Wang, YX
    Yun, WB
    Jacobsen, C
    NATURE, 2003, 424 (6944) : 50 - 53
  • [36] Progress and prospects in nonlinear extreme-ultraviolet and X-ray optics and spectroscopy
    Chergui, Majed
    Beye, Martin
    Mukamel, Shaul
    Svetina, Cristian
    Masciovecchio, Claudio
    NATURE REVIEWS PHYSICS, 2023, 5 (10) : 578 - 596
  • [37] Progress and prospects in nonlinear extreme-ultraviolet and X-ray optics and spectroscopy
    Majed Chergui
    Martin Beye
    Shaul Mukamel
    Cristian Svetina
    Claudio Masciovecchio
    Nature Reviews Physics, 2023, 5 : 578 - 596
  • [38] A new endstation for extreme-ultraviolet spectroscopy of free clusters and nanodroplets
    Bastian, Bjoern
    Asmussen, Jakob D.
    Ben Ltaief, Ltaief
    Czasch, Achim
    Jones, Nykola C.
    Hoffmann, Soren V.
    Pedersen, Henrik B.
    Mudrich, Marcel
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2022, 93 (07): : 075110
  • [39] Extreme-Ultraviolet Vortices from a Free-Electron Laser
    Ribic, Primoz Rebernik
    Roesner, Benedikt
    Gauthier, David
    Allaria, Enrico
    Doering, Florian
    Foglia, Laura
    Giannessi, Luca
    Mahne, Nicola
    Manfredda, Michele
    Masciovecchio, Claudio
    Mincigrucci, Riccardo
    Mirian, Najmeh
    Principi, Emiliano
    Roussel, Eleonore
    Simoncig, Alberto
    Spampinati, Simone
    David, Christian
    De Ninno, Giovanni
    PHYSICAL REVIEW X, 2017, 7 (03):
  • [40] Phase Imaging of Extreme-Ultraviolet Mask Using Coherent Extreme-Ultraviolet Scatterometry Microscope
    Harada, Tetsuo
    Nakasuji, Masato
    Nagata, Yutaka
    Watanabe, Takeo
    Kinoshita, Hiroo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (06)