METASTABLE DEFECTS IN GAAS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION - DEPENDENCE ON THE V/III-RATIO

被引：13
|
作者：
TABATA, AS [1 ]
PUDENZI, MAA [1 ]
MACHADO, AM [1 ]
机构：
[1] CTR PESQUISA & DESENVOLVIMENTO TELEBRAS, CAMPINAS, SP, BRAZIL
来源：
JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 10期
关键词：
D O I：
10.1063/1.343338
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：4076 / 4078
页数：3
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