LATTICE TEMPERATURE OF GAAS AND SI DURING PULSED LASER ANNEALING

被引：0
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作者：
POSPIESZCZYK, A [1 ]
HARITH, MA [1 ]
STRITZKER, B [1 ]
机构：
[1] KERNFORSCHUNGSANLAGE JULICH,INST FESTKORPERFORSCH,D-5170 JULICH,FED REP GER
来源：
JOURNAL DE PHYSIQUE | 1983年 / 44卷 / NC-5期
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D O I：
10.1051/jphyscol:1983521
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学科分类号：
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页码：129 / 129
页数：1
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