PROPERTIES OF ALUMINUM NITRIDE FILMS BY AN ION-BEAM AND VAPOR-DEPOSITION METHOD

被引:37
|
作者
OGATA, K
ANDOH, Y
KAMIJO, E
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D O I
10.1016/0168-583X(89)90766-0
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
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页码:178 / 181
页数:4
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