共 50 条
- [41] High-rate reactive magnetron sputtering of zirconia films for laser optics applications Applied Physics A, 2014, 116 : 1229 - 1240
- [42] SELF-SPUTTERING PHENOMENA IN HIGH-RATE COAXIAL CYLINDRICAL MAGNETRON SPUTTERING JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 143 - 146
- [44] High-rate reactive magnetron sputtering of zirconia films for laser optics applications APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2014, 116 (03): : 1229 - 1240
- [45] MODEL ATTACHMENT FOR HARD-COATING OF TOOLS BY MAGNETRON HIGH-RATE SPUTTERING PLASMA SURFACE ENGINEERING, VOLS 1 AND 2, 1989, : 637 - 642
- [46] High-rate deposition of protective alumina films by means of reactive magnetron spraying Fizika i Khimiya Obrabotki Materialov, 1999, (02): : 46 - 49
- [47] REACTIVE DC HIGH-RATE SPUTTERING WITH THE MAGNETRON-PLASMATRON FOR INDUSTRIAL APPLICATIONS VAKUUM-TECHNIK, 1981, 30 (01): : 3 - 14
- [48] APPLICATION OF HIGH-RATE EXB OR MAGNETRON SPUTTERING IN METALLIZATION OF SEMICONDUCTOR-DEVICES JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01): : 157 - 164
- [50] ETCHING TANTALUM POLYCIDE EMPLOYING A MAGNETRON DISCHARGE. Vide, les Couches Minces, 1985, (229):