TEMPERATURE DISTRIBUTION ON THIN-FILM METALLIZATIONS

被引：15
|
作者：
CHAUG, YS
HUANG, HL
机构：
[1] TATUNG INST TECHNOL,TAIPEI,TAIWAN
[2] NATL TAIWAN UNIV,DEPT PHYS,TAIPEI,TAIWAN
来源：
JOURNAL OF APPLIED PHYSICS | 1976年 / 47卷 / 05期
关键词：
D O I：
10.1063/1.322890
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1775 / 1779
页数：5
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