PLASMA-ETCHING OF NONOXIDE CERAMICS

被引:3
|
作者
MITOMO, M
SATO, Y
YASHIMA, I
TSUTSUMI, M
机构
[1] National Institute for Research in Inorganic Materials, Ibaraki, 305, 1-1, Namiki, Tsukuba-shi
关键词
D O I
10.1007/BF00721916
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
[No abstract available]
引用
收藏
页码:83 / 84
页数:2
相关论文
共 50 条
  • [41] ENDPOINT DETECTION IN PLASMA-ETCHING
    ROLAND, JP
    MARCOUX, PJ
    RAY, GW
    RANKIN, GH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 631 - 636
  • [42] MICROSCOPIC UNIFORMITY IN PLASMA-ETCHING
    GOTTSCHO, RA
    JURGENSEN, CW
    VITKAVAGE, DJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (05): : 2133 - 2147
  • [43] PLANAR PLASMA-ETCHING OF CHROMIUM
    NAGUIB, HM
    BOND, RA
    POLEY, HJ
    VACUUM, 1983, 33 (05) : 285 - 290
  • [44] GASES FOR PLASMA-ETCHING - WHATS IN A NAME
    POWELL, RA
    SOLID STATE TECHNOLOGY, 1984, 27 (04) : 301 - 302
  • [45] FUNDAMENTAL CHARACTERISTICS OF MICROWAVE PLASMA-ETCHING
    SUZUKI, K
    OKUDAIRA, S
    NISHIMATSU, S
    USAMI, K
    KANOMATA, I
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (08) : C373 - C373
  • [46] ADVANCES IN PLANAR PLASMA-ETCHING EQUIPMENT
    LECLAIRE, R
    SOLID STATE TECHNOLOGY, 1979, 22 (04) : 139 - 142
  • [47] DESIGN OF PLASMA-ETCHING AND DEPOSITION SYSTEMS
    KUMAGAI, HY
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 1800 - 1804
  • [48] HYDROGEN PLASMA-ETCHING OF SEMICONDUCTORS AND THEIR OXIDES
    CHANG, RPH
    CHANG, CC
    DARACK, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 490 - 491
  • [49] LOCALIZED PLASMA-ETCHING FOR DEVICE OPTIMIZATION
    LARSON, DR
    VEASEY, DL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (01): : 27 - 29
  • [50] PLASMA-ETCHING OF SILICON WITH NITROGEN TRIFLUORIDE
    EISELE, KM
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (03) : C89 - C89