MODEL FOR GAS-LASER INTERACTION - APPLICATION TO THERMALLY ACTIVATED LASER-INDUCED CHEMICAL VAPOR-DEPOSITION

被引：5
|
作者：
PAN, ETS
FLINT, JH
LIANG, JM
ADLER, D
HAGGERTY, JS
机构：
来源：
APPLIED OPTICS | 1987年 / 26卷 / 01期
关键词：
D O I：
10.1364/AO.26.000070
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：70 / 75
页数：6
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