MODEL FOR GAS-LASER INTERACTION - APPLICATION TO THERMALLY ACTIVATED LASER-INDUCED CHEMICAL VAPOR-DEPOSITION

被引：5

|

作者：

PAN, ETS

FLINT, JH

LIANG, JM

ADLER, D

HAGGERTY, JS

机构：

来源：

APPLIED OPTICS | 1987年 / 26卷 / 01期

关键词：

D O I：

10.1364/AO.26.000070

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

收藏

页码：70 / 75

页数：6

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