NOVEL METHODS FOR MEASURING DIAMETER OF FOCUSED ION-BEAM

被引:1
|
作者
MORITA, T
ARIMOTO, H
MIYAUCHI, E
HASHIMOTO, H
机构
关键词
D O I
10.1143/JJAP.26.289
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:289 / 292
页数:4
相关论文
共 50 条
  • [31] LARGE DIAMETER ION-BEAM IMPLANTATION SYSTEM
    MATSUDA, K
    FUKUMARU, F
    MIZUTANI, Y
    KONISHI, M
    MATSUNAGA, K
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 21 (2-4): : 314 - 316
  • [32] CHARACTERIZATION OF FOCUSED ION-BEAM MICROMACHINED FEATURES
    PELLERIN, JG
    SHEDD, GM
    GRIFFIS, DP
    RUSSELL, PE
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1810 - 1812
  • [33] SILYLATION OF FOCUSED ION-BEAM EXPOSED RESISTS
    HARTNEY, MA
    SHAVER, DC
    SHEPARD, MI
    HUH, JS
    MEINGAILIS, J
    APPLIED PHYSICS LETTERS, 1991, 59 (04) : 485 - 487
  • [34] FOCUSED ION-BEAM SIMS FOR MICROMACHINING APPLICATIONS
    HARRIOTT, LR
    VASILE, MJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (08) : C375 - C375
  • [35] MICROANALYSIS BY FOCUSED MEV HELIUM ION-BEAM
    TAKAI, M
    MATSUNAGA, K
    INOUE, K
    IZUMI, M
    GAMO, K
    SATO, M
    NAMBA, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1987, 26 (05): : L550 - L553
  • [36] FOCUSED ION-BEAM USING A TRIODE GUN
    KOMURO, M
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C110 - C110
  • [37] PRECISE MEASUREMENT OF A FOCUSED ION-BEAM PROFILE
    SHUKURI, S
    WADE, Y
    TAMURA, M
    UMEMURA, K
    ISHITANI, T
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (06) : 1536 - 1540
  • [38] FOCUSED PHOSPHORUS ION-BEAM IMPLANTATION INTO SILICON
    MADOKORO, Y
    SHUKURI, S
    UMEMURA, K
    TAMURA, M
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 39 (1-4): : 511 - 514
  • [39] FOCUSED ION-BEAM INDUCED DEPOSITION OF GOLD
    SHEDD, GM
    LEZEC, H
    DUBNER, AD
    MELNGAILIS, J
    APPLIED PHYSICS LETTERS, 1986, 49 (23) : 1584 - 1586
  • [40] ALIGNMENT ACCURACY OF FOCUSED ION-BEAM IMPLANTATION
    MORITA, T
    ARIMOTO, H
    MIYAUCHI, E
    HASHIMOTO, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (06): : 955 - 958