NOVEL METHODS FOR MEASURING DIAMETER OF FOCUSED ION-BEAM

被引：1
|
作者：
MORITA, T
ARIMOTO, H
MIYAUCHI, E
HASHIMOTO, H
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1987年 / 26卷 / 02期
关键词：
D O I：
10.1143/JJAP.26.289
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：289 / 292
页数：4
相关论文
共 50 条
  • [21] FOCUSED ION-BEAM ETCHING OF NITROCELLULOSE
    YASUOKA, Y
    HARAKAWA, K
    GAMO, K
    NAMBA, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 405 - 408
  • [22] ION-BEAM ASSISTED ETCHING OF GAAS BY LOW-ENERGY FOCUSED ION-BEAM
    KOSUGI, T
    GAMO, K
    NAMBA, S
    AIHARA, R
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (05): : 2660 - 2663
  • [23] ION-BEAM ASSISTED MASKLESS ETCHING OF GAAS BY 50 KEV FOCUSED ION-BEAM
    GAMO, K
    OCHIAI, Y
    NAMBA, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (12): : L792 - L794
  • [24] Beam diameter measurement in focused ion beam system
    Zhang, Haibo
    Zhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology, 2000, 20 (05): : 319 - 321
  • [25] FOCUSED ION-BEAM INDUCED DEPOSITION OF PLATINUM
    TAO, T
    RO, JS
    MELNGAILIS, J
    XUE, ZL
    KAESZ, HD
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06): : 1826 - 1829
  • [26] INSITU PATTERNING OF GAAS BY FOCUSED ION-BEAM
    KOSUGI, T
    YAMASHIRO, T
    AIHARA, R
    GAMO, K
    NAMBA, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 3099 - 3102
  • [27] FOCUSED ION-BEAM GALLIUM IMPLANTATION INTO SILICON
    TAMURA, M
    SHUKURI, S
    MONIWA, M
    DEFAULT, M
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1986, 39 (03): : 183 - 190
  • [28] NANOSTRUCTURES PROCESSING BY FOCUSED ION-BEAM IMPLANTATION
    PETROFF, PM
    LI, YJ
    XU, Z
    BEINSTINGL, W
    SASA, S
    ENSSLIN, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 3074 - 3078
  • [29] FOCUSED ION-BEAM DESIGNS FOR SPUTTER DEPOSITION
    KAUFMAN, HR
    HARPER, JME
    CUOMO, JJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 179 - 180
  • [30] FOCUSED ION-BEAM TECHNOLOGIES FOR LITHOGRAPHIC APPLICATIONS
    KATO, T
    YASUOKA, A
    FUJIKAWA, K
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 37-8 : 218 - 223
12345