A HIGH-POWER, LOW-CONTAMINATION LASER-PLASMA SOURCE FOR EXTREME UV LITHOGRAPHY

被引：7
|
作者：
BIJKERK, F
SHMAENOK, LA
SHEVELKO, AP
BASTIAENSEN, RKFJ
BRUINEMAN, C
VANHONK, AGJR
机构：
[1] FOM-Institute for Plasma Physics Rijnhuizen, 3439 MN Nieuwegein
[2] Lebedev Physical Institute, 117924 Moscow, Leninsky Prospekt 53
来源：
MICROELECTRONIC ENGINEERING | 1995年 / 27卷 / 1-4期
关键词：
LASER PLASMA EUV SOURCE; EUV SPECTRA; MITIGATION OF PLASMA DEBRIS;
D O I：
10.1016/0167-9317(94)00111-7
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Experimental results are reported on the development of a low-contamination laser-plasma source for extreme ultra-violet lithography (EUVL). The results concern the intensity in the 12.5 to 15.5 nm wavelength range and the pollution of EUV optics by plasma debris.
引用
收藏
页码：299 / 301
页数：3
相关论文
共 50 条
  • [41] RELATIVE CALIBRATION OF X-UV INSTRUMENTS WITH A LASER-PLASMA SOURCE
    BENATTAR, R
    MAZATAUD, D
    MENS, A
    SALIERES, P
    SCHIRMANN, D
    INSTITUTE OF PHYSICS CONFERENCE SERIES, 1992, (125): : 375 - 378
  • [42] A WIDE BANDWIDTH, HIGH-POWER LASER SOURCE FOR PLASMA INTERACTION STUDIES
    BANFI, GP
    GOBBI, PG
    MUSSONE, L
    REALI, GC
    OPTICS COMMUNICATIONS, 1983, 44 (03) : 192 - 195
  • [43] High power laser-produced plasma source for nano-lithography
    Forber, R
    Gaeta, C
    Rieger, H
    Siegert, H
    McLeod, S
    Boerger, B
    LASER-GENERATED AND OTHER LABORATORY X-RAY AND EUV SOURCES, OPTICS, AND APPLICATIONS, 2003, 5196 : 97 - 108
  • [44] HIGH-POWER RADIOFREQUENCY PLASMA SOURCE
    PETTY, CC
    SMITH, DK
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1986, 57 (10): : 2409 - 2414
  • [45] Interference lithography processes with high-power laser pulses
    Rodriguez, A.
    Ellman, M.
    Ayerdi, I.
    Perez, N.
    Olaizola, S. M.
    Zhang, J.
    Ji, Z.
    Berthou, T.
    Peng, C. S.
    Verevkin, Y. K.
    Wang, Z.
    LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING VII, 2009, 7201
  • [46] X-ray spectral measurements of the JMAR high power laser-plasma source
    Whitlock, RR
    Dozier, CM
    Newman, DA
    Turcu, ICE
    Gaeta, CJ
    Cassidy, KL
    Powers, MF
    Kleindolph, T
    Morris, JH
    Forber, R
    ADVANCES IN LABORATORY-BASED X-RAY SOURCES AND OPTICS III, 2002, 4781 : 35 - 41
  • [47] CONTINUOUS HIGH-POWER UV ION LASER
    LUTHI, HR
    SEELIG, W
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1976, 66 (10) : 1098 - 1098
  • [48] Laser-produced plasma light source for extreme ultraviolet lithography
    Shields, H
    Fornaca, SW
    Petach, MB
    Orsini, RA
    Moyer, RH
    St Pierre, RJ
    PROCEEDINGS OF THE IEEE, 2002, 90 (10) : 1689 - 1695
  • [49] 180NM X-RAY-LITHOGRAPHY WITH A HIGH-REPETITION-RATE LASER-PLASMA SOURCE
    TURCU, ICE
    REEVES, CM
    STEVENSON, JTM
    ROSS, AWS
    GUNDLACH, AM
    PREWETT, P
    ANASTASI, P
    KOEK, B
    MITCHELL, P
    LAKE, P
    MICROELECTRONIC ENGINEERING, 1995, 27 (1-4) : 295 - 298
  • [50] Design of a soft X-ray and extreme UV reflectometer equipped with a high-resolution monochromator and high-brightness laser-plasma radiation source
    Dogadin V.O.
    Zuev S.Y.
    Salashchenko N.N.
    Chkhalo N.I.
    Shcherbakov A.V.
    Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques, 2015, 9 (4) : 726 - 734
12345