A HIGH-POWER, LOW-CONTAMINATION LASER-PLASMA SOURCE FOR EXTREME UV LITHOGRAPHY

被引：7
|
作者：
BIJKERK, F
SHMAENOK, LA
SHEVELKO, AP
BASTIAENSEN, RKFJ
BRUINEMAN, C
VANHONK, AGJR
机构：
[1] FOM-Institute for Plasma Physics Rijnhuizen, 3439 MN Nieuwegein
[2] Lebedev Physical Institute, 117924 Moscow, Leninsky Prospekt 53
来源：
MICROELECTRONIC ENGINEERING | 1995年 / 27卷 / 1-4期
关键词：
LASER PLASMA EUV SOURCE; EUV SPECTRA; MITIGATION OF PLASMA DEBRIS;
D O I：
10.1016/0167-9317(94)00111-7
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Experimental results are reported on the development of a low-contamination laser-plasma source for extreme ultra-violet lithography (EUVL). The results concern the intensity in the 12.5 to 15.5 nm wavelength range and the pollution of EUV optics by plasma debris.
引用
收藏
页码：299 / 301
页数：3
相关论文
共 50 条
  • [11] High-power collimated laser-plasma source for proximity x-ray nanolithography
    Gaeta, CJ
    Rieger, H
    Turcu, ICE
    Forber, RA
    Campeau, SM
    Cassidy, KL
    Powers, MF
    Stone, A
    Maldonado, JR
    Mrowka, S
    French, G
    Naungayan, J
    Kelsy, C
    Hark, P
    Morris, JH
    Foster, RM
    Carosella, JC
    Fleming, D
    Selzer, F
    Siegert, H
    Smith, HI
    Lim, MH
    Cheng, Z
    Burdett, J
    Gibson, D
    Whitlock, RR
    Dozier, CM
    Newman, DA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (01): : 280 - 287
  • [12] New high-power laser facility PALS -: prospects for laser-plasma research
    Rus, B
    Rohlena, K
    Skála, J
    Králiková, B
    Jungwirth, K
    Ullschmied, J
    Witte, KJ
    Baumhacker, H
    LASER AND PARTICLE BEAMS, 1999, 17 (02) : 179 - 194
  • [13] Laser and optical developments of a modular laser-plasma source for EUV lithography
    Cheymol, G
    Cormont, P
    Farcage, D
    Montmerle-Bonnefois, A
    Thro, PY
    Weulersse, JM
    Schmidt, M
    Sublemontier, O
    Barthod, B
    Gaurand, I
    Skrzypczak, J
    Emerging Lithographic Technologies IX, Pts 1 and 2, 2005, 5751 : 759 - 768
  • [14] High-Power γ-Ray Flash Generation in Ultraintense Laser-Plasma Interactions
    Nakamura, Tatsufumi
    Koga, James K.
    Esirkepov, Timur Zh.
    Kando, Masaki
    Korn, Georg
    Bulanov, Sergei V.
    PHYSICAL REVIEW LETTERS, 2012, 108 (19)
  • [15] Production of ion beams in high-power laser-plasma interactions and their applications
    Pegoraro, F
    Atzeni, S
    Borghesi, M
    Bulanov, S
    Esirkepov, T
    Honrubia, J
    Kato, Y
    Khoroshkov, V
    Nishihara, K
    Tajima, T
    Temporal, M
    Willi, O
    LASER AND PARTICLE BEAMS, 2004, 22 (01) : 19 - 24
  • [16] Measuring magnetic flux suppression in high-power laser-plasma interactions
    Campbell, P. T.
    Walsh, C. A.
    Russell, B. K.
    Chittenden, J. P.
    Crilly, A.
    Fiksel, G.
    Gao, L.
    Igumenshchev, I. V.
    Nilson, P. M.
    Thomas, A. G. R.
    Krushelnick, K.
    Willingale, L.
    PHYSICS OF PLASMAS, 2022, 29 (01)
  • [17] High-power laser plasma source of nuclear reaction
    Andreev, AA
    Charukchev, AV
    Yashin, VE
    LASER OPTICS 2000: ULTRAFAST OPTICS AND SUPERSTRONG LASER FIELDS, 2001, 4352 : 102 - 112
  • [18] High power laser plasma EUV light source for lithography
    Endo, A
    HIGH-POWER LASER ABLATION V, PTS 1 AND 2, 2004, 5448 : 704 - 711
  • [19] Development of a plasma laser source for lithography in extreme ultraviolet
    Soullié, G
    Lafon, C
    Rosch, R
    Babonneau, D
    Garaude, F
    Huelvan, S
    Trublet, T
    Bonnet, L
    Marmoret, R
    JOURNAL DE PHYSIQUE IV, 2003, 108 : 275 - 279
  • [20] Extreme ultraviolet spectroscopy of a laser plasma source for lithography
    Shevelko, AP
    Shmaenok, LA
    Churilov, SS
    Bastiaensen, RKFJ
    Bijkerk, F
    PHYSICA SCRIPTA, 1998, 57 (02): : 276 - 282
12345