A HIGH-POWER, LOW-CONTAMINATION LASER-PLASMA SOURCE FOR EXTREME UV LITHOGRAPHY

被引：7
|
作者：
BIJKERK, F
SHMAENOK, LA
SHEVELKO, AP
BASTIAENSEN, RKFJ
BRUINEMAN, C
VANHONK, AGJR
机构：
[1] FOM-Institute for Plasma Physics Rijnhuizen, 3439 MN Nieuwegein
[2] Lebedev Physical Institute, 117924 Moscow, Leninsky Prospekt 53
来源：
MICROELECTRONIC ENGINEERING | 1995年 / 27卷 / 1-4期
关键词：
LASER PLASMA EUV SOURCE; EUV SPECTRA; MITIGATION OF PLASMA DEBRIS;
D O I：
10.1016/0167-9317(94)00111-7
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Experimental results are reported on the development of a low-contamination laser-plasma source for extreme ultra-violet lithography (EUVL). The results concern the intensity in the 12.5 to 15.5 nm wavelength range and the pollution of EUV optics by plasma debris.
引用
收藏
页码：299 / 301
页数：3
相关论文
共 50 条
  • [1] High-power compact laser-plasma source for x-ray lithography
    Gaeta, CJ
    Rieger, H
    Turcu, ICE
    Forber, RA
    Campeau, SM
    Cassidy, KL
    Powers, MJ
    Maldonado, JR
    French, G
    Naungayan, J
    Kelsey, C
    Hark, P
    Morris, JH
    Foster, RM
    Smith, HI
    Lim, MH
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (6B): : 4111 - 4121
  • [2] High-power compact laser-plasma source for X-ray lithography
    Gaeta, Celestino J.
    Rieger, Harry
    Edmond Turcu, I.C.
    Forber, Richard A.
    Campeau, Serge M.
    Cassidy, Kelly L.
    Powers, Michael J.
    Maldonado, Juan R.
    French, Gary
    Naungayan, Joseph
    Kelsey, Charles
    Hark, Peter
    Morris, James H.
    Foster, Richard M.
    Smith, Henry I.
    Lim, Michael H.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2002, 41 (6 B): : 4111 - 4121
  • [3] High power laser-plasma x-ray source for lithography
    Gaeta, CJ
    Rieger, H
    Turcu, ICE
    Forber, RA
    Cassidy, KL
    Campeau, SM
    Powers, MJ
    Maldonado, JR
    Morris, JH
    Foster, RM
    Smith, HI
    Lim, MH
    EMERGING LITHOGRAPHIC TECHNOLOGIES VI, PTS 1 AND 2, 2002, 4688 : 818 - 833
  • [4] NEW LASER-PLASMA SOURCE FOR EXTREME-ULTRAVIOLET LITHOGRAPHY
    JIN, F
    RICHARDSON, M
    APPLIED OPTICS, 1995, 34 (25): : 5750 - 5760
  • [5] Compact high power laser-plasma x-ray source for lithography
    Gaeta, CJ
    Rieger, H
    Turcu, ICE
    Forber, RA
    Campeau, SM
    Cassidy, KL
    Powers, MF
    Grygier, RK
    Maldonado, JR
    French, G
    Naunguyan, J
    Kelsy, C
    Hark, P
    Morris, JH
    Foster, RM
    MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS, 2001, : 292 - 292
  • [6] Compact high power laser-plasma x-ray source for lithography
    Gaeta, CJ
    Rieger, H
    Turcu, ICE
    Forber, RA
    Campeau, SM
    Cassidy, KL
    Powers, MF
    Grygier, RK
    Maldonado, JR
    French, G
    Naungayan, J
    Kelsy, C
    Hark, P
    Morris, JH
    Foster, RM
    ADVANCES IN LABORATORY-BASED X-RAY SOURCES AND OPTICS II, 2001, 4502 : 82 - 95
  • [7] HIGH-POWER UV (.3513MU-M) LASER-PLASMA ABSORPTION STUDIES
    NICHOLSON, B
    SEKA, W
    FORSLEY, L
    BLUMENTHAL, D
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1980, 25 (08): : 895 - 895
  • [8] High-power source and illumination system for extreme ultraviolet lithography
    Kubiak, GD
    Bernardez, LJ
    Krenz, K
    Replogle, WC
    Sweatt, WC
    Sweeney, DW
    Hudyma, RM
    Shields, H
    EUV, X-RAY, AND NEUTRON OPTICS AND SOURCES, 1999, 3767 : 136 - 142
  • [9] High-power laser-plasma chemistry in planetary atmospheres
    Civis, Svatopluk
    Juha, Libor
    IAU: ORGANIC MATTER IN SPACE, 2008, (251): : 473 - +
  • [10] High-power laser-plasma chemistry in planetary atmospheres
    Juha, Libor
    Ferus, Martin
    Kubelik, Petr
    Krasa, Josef
    Skala, Jiri
    Pfeifer, Miroslav
    Civis, Svatopluk
    Cihelka, Jaroslav
    Babankova, Dagmar
    ASTROBIOLOGY, 2007, 7 (03) : 516 - 517
12345