HIGH ASPECT RATIO PHOTOELECTROCHEMICAL ETCHING OF COMPOUND SEMICONDUCTORS

被引：0
|
作者：
CARRABBA, MM [1 ]
RAUH, RD [1 ]
机构：
[1] EIC LABS INC,NORWOOD,MA 02062
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 04期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C175 / C175
页数：1
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