SOME ELECTRICAL AND OPTICAL-PROPERTIES OF NICKEL-RELATED DEEP LEVELS IN SILICON

被引:3
|
作者
BARTOS, J [1 ]
TESAR, L [1 ]
机构
[1] TESLA ROZNOV NP, CS-75661 ROZNOV, CZECHOSLOVAKIA
关键词
D O I
10.1002/pssa.2211220222
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Silicon wafers with p-n junctions are contaminated by nickel and the temperature behaviour of the reverse current of these p-n junctions is investigated. Nickel-related deep energy levels are studied by DLTS measurement. The dominant energy level of Ni is at E(v) + 0.31 eV. The illumination and annealing sensitivity of this level is also observed. An attempt is made to explain qualitatively this phenomenon.
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页码:607 / 616
页数:10
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