DISSOCIATION KINETICS OF HYDROGEN-PASSIVATED (100)SI/SIO2 INTERFACE DEFECTS (VOL 77, PG 6205, 1995)

被引：9
|
作者：
STATHIS, JH
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1995年 / 78卷 / 08期
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D O I：
10.1063/1.360786
中图分类号：
O59 [应用物理学];
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页码：5215 / 5215
页数：1
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