DISSOCIATION KINETICS OF HYDROGEN-PASSIVATED (100)SI/SIO2 INTERFACE DEFECTS (VOL 77, PG 6205, 1995)

被引：9

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作者：

STATHIS, JH

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JOURNAL OF APPLIED PHYSICS | 1995年 / 78卷 / 08期

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D O I：

10.1063/1.360786

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O59 [应用物理学];

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页码：5215 / 5215

页数：1

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