STRESS RELATED ANISOTROPY STUDIES IN DC-MAGNETRON SPUTTERED TBCO AND TBFE FILMS

被引:24
|
作者
CHENG, SCN
KRYDER, MH
MATHUR, MCA
机构
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D O I
10.1109/20.42509
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:4018 / 4020
页数:3
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