CHEMICALLY ENHANCED ION ETCHING ON REFRACTORY-METAL SILICIDES

被引：7

作者：

OBRIEN, WL

RHODIN, TN

RATHBUN, LC

机构：

[1] CORNELL UNIV,SCH APPL & ENGN PHYS,ITHACA,NY 14853

[2] CORNELL UNIV,NATL NANOFABRICAT FACIL,ITHACA,NY 14853

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575709

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1384 / 1387

页数：4

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