CHEMICALLY ENHANCED ION ETCHING ON REFRACTORY-METAL SILICIDES

被引：7
|
作者：
OBRIEN, WL
RHODIN, TN
RATHBUN, LC
机构：
[1] CORNELL UNIV,SCH APPL & ENGN PHYS,ITHACA,NY 14853
[2] CORNELL UNIV,NATL NANOFABRICAT FACIL,ITHACA,NY 14853
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期
关键词：
D O I：
10.1116/1.575709
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：1384 / 1387
页数：4
相关论文
共 50 条
  • [31] PLASMA-INDUCED DAMAGE OF GAAS DURING ETCHING OF REFRACTORY-METAL CONTACTS
    SHUL, RJ
    LOVEJOY, ML
    BACA, AG
    ZOLPER, JC
    RIEGER, DJ
    HAFICH, MJ
    CORLESS, RF
    VARTULI, CB
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03): : 912 - 917
  • [32] REFRACTORY-METAL INTERCONNECTS FOR VHSIC
    ROTH, LB
    HAGEN, G
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1982, 319 : 15 - 21
  • [33] REFRACTORY-METAL EMBRITTLEMENT OF ZIRCALOY
    KOHLI, R
    JOURNAL OF METALS, 1980, 32 (08): : 42 - 42
  • [34] SPUTTERING OF REFRACTORY-METAL SILICIDES FROM COMPOSITE CATHODES USED IN THE VARIAN 3180/3190 SPUTTERING SYSTEM
    NICHOLS, DR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (04): : 771 - 774
  • [35] SPUTTER DEPOSITION OF REFRACTORY-METAL SILICIDES FROM COLD-PRESSED VACUUM-SINTERED TARGETS
    SRIDHAR, CG
    CHOW, R
    NOCERINO, G
    THIN SOLID FILMS, 1986, 140 (01) : 51 - 57
  • [36] FABRICATION OF SHORT CHANNEL MOSFETS WITH REFRACTORY-METAL GATES USING RF SPUTTER ETCHING
    RODRIGUEZ, A
    MISRA, M
    HESSELBOM, H
    TOVE, PA
    SOLID-STATE ELECTRONICS, 1976, 19 (01) : 17 - &
  • [37] LINEWIDTH UNIFORMITY VERSUS ETCH RATE UNIFORMITY IN REFRACTORY-METAL PLASMA-ETCHING
    FRANSSILA, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (05): : 2963 - 2969
  • [38] SELECTIVELY EMISSIVE REFRACTORY-METAL SURFACES
    CRAIGHEAD, HG
    HOWARD, RE
    TENNANT, DM
    APPLIED PHYSICS LETTERS, 1981, 38 (02) : 74 - 76
  • [39] TEMPERATURE OF MODIFICATION OF FLOW TENSION - CHARACTERISTIC TEMPERATURE OF OD, MELTING TEMPERATURE IN REFRACTORY-METAL SILICIDES AND OTHER MATERIALS
    OSIPOV, AD
    PISMA V ZHURNAL TEKHNICHESKOI FIZIKI, 1992, 18 (21): : 85 - 91
  • [40] PULSE SOURCE OF REFRACTORY-METAL PLASMA
    MURAVYOV, II
    GORBUNOVA, TM
    YANCHARINA, AM
    IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII FIZIKA, 1988, 31 (04): : 48 - 52
12345