CHEMICALLY ENHANCED ION ETCHING ON REFRACTORY-METAL SILICIDES

被引：7
|
作者：
OBRIEN, WL
RHODIN, TN
RATHBUN, LC
机构：
[1] CORNELL UNIV,SCH APPL & ENGN PHYS,ITHACA,NY 14853
[2] CORNELL UNIV,NATL NANOFABRICAT FACIL,ITHACA,NY 14853
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期
关键词：
D O I：
10.1116/1.575709
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：1384 / 1387
页数：4
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