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GAS-PHASE DIAGNOSTICS AND MODELING OF TIN OXIDE CHEMICAL VAPOR-DEPOSITION
被引:0
|
作者
:
BORMAN, CG
论文数:
0
引用数:
0
h-index:
0
机构:
GE,ELECTR LAB,SYRACUSE,NY 13201
BORMAN, CG
BIENSTOCK, S
论文数:
0
引用数:
0
h-index:
0
机构:
GE,ELECTR LAB,SYRACUSE,NY 13201
BIENSTOCK, S
ZAWADZKI, A
论文数:
0
引用数:
0
h-index:
0
机构:
GE,ELECTR LAB,SYRACUSE,NY 13201
ZAWADZKI, A
GORDON, RG
论文数:
0
引用数:
0
h-index:
0
机构:
GE,ELECTR LAB,SYRACUSE,NY 13201
GORDON, RG
机构
:
[1]
GE,ELECTR LAB,SYRACUSE,NY 13201
[2]
HARVARD UNIV,SMITHSONIAN CTR ASTROPHYS,CAMBRIDGE,MA 02138
[3]
HARVARD UNIV,DEPT CHEM,CAMBRIDGE,MA 02138
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1982年
/ 129卷
/ 08期
关键词
:
D O I
:
暂无
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:C328 / C328
页数:1
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