CHARACTERIZATION OF ELECTRICAL-PROPERTIES OF OXYGEN HYDROGEN RICH SILICON-NITRIDE FILMS FOR MNOS DEVICES

被引：0

作者：

XU, D ^{[1
]}

KAPOOR, VJ ^{[1
]}

机构：

[1] UNIV CINCINNATI,DEPT ELECT & COMP ENGN,ELECTR DEVICES & MAT RES LAB,CINCINNATI,OH 45221

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 08期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C361 / C361

页数：1

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