REDUCED ABERRATIONS IN AN ELECTRON MATRIX LENS THROUGH THE USE OF OFFSET APERTURES

被引：5

|

作者：

KURIHARA, K

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 05期

关键词：

D O I：

10.1116/1.583490

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：1251 / 1255

页数：5

相关论文

共 50 条

[1] The correction of electron lens aberrations
Hawkes, P. W.
ULTRAMICROSCOPY, 2015, 156 : A1 - A64
[2] The relationship of lens aberrations to image aberrations in electron optics
Rempfer, GF
OPTIK, 1999, 110 (01): : 17 - 24
[3] Relationship of lens aberrations to image aberrations in electron optics
Rempfer, G.F.
Optik (Jena), 1999, 110 (01): : 17 - 24
[4] ADDITION OF ROUND ELECTRON LENS ABERRATIONS
HAWKES, PW
OPTIK, 1970, 31 (06): : 592 - &
[5] The Aberrations of the weak magnetic Electron Lens
Gratsiatos, J.
ZEITSCHRIFT FUR PHYSIK, 1937, 107 (03): : 382 - 386
[6] ELECTRON-BEAM CHARACTERISTICS INFERRED USING EXPERIMENTAL LENS TRANSMISSION THROUGH A PAIR OF APERTURES
VENUS, D
SAWLER, J
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1992, 61 (01) : 131 - 142
[7] GRIN Lens Design Through the use of Surrogate Models Based on Zernike Aberrations
Easum, John A.
Nagar, Jogender
Campbell, Sawyer D.
Werner, Douglas H.
2016 IEEE ANTENNAS AND PROPAGATION SOCIETY INTERNATIONAL SYMPOSIUM, 2016, : 573 - 574
[8] Optimal lens assignment through measured aberrations
Seong, NG
Kang, YS
Cho, HK
Moon, J
OPTICAL MICROLITHOGRAPHY XIV, PTS 1 AND 2, 2001, 4346 : 1 - 7
[9] Transmission of intense electron beams through apertures
Harris, J. R.
Lewellen, J. W.
PHYSICS OF PLASMAS, 2010, 17 (04)
[10] COMPENSATION FOR LENS ABERRATIONS IN ELECTRON-MICROSCOPIC HOLOGRAPHY
MIRANDE, W
MIKROSKOPIE, 1973, 28 (11-1) : 366 - 367

← 1 2 3 4 5 →