PLASMA AND SURFACE-REACTIONS IN A-SI-H DEPOSITION DISCHARGES

被引：0
|
作者：
GALLAGHER, A [1 ]
机构：
[1] UNIV COLORADO,NATL INST STAND & TECHNOL,JOINT INST LAB ASTROPHYS,BOULDER,CO 80302
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1991年 / 201卷
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：242 / PHYS
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