PLASMA AND SURFACE-REACTIONS IN A-SI-H DEPOSITION DISCHARGES

被引：0

作者：

GALLAGHER, A ^{[1
]}

机构：

[1] UNIV COLORADO,NATL INST STAND & TECHNOL,JOINT INST LAB ASTROPHYS,BOULDER,CO 80302

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1991年 / 201卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：242 / PHYS

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