ORIGINS OF STRESS-INDUCED PERPENDICULAR MAGNETIC-ANISOTROPY OF SPUTTERED IRON-OXIDE THIN-FILMS

被引：9

作者：

LIN, JK ^{[1
]}

SIVERTSEN, JM ^{[1
]}

JUDY, JH ^{[1
]}

机构：

[1] UNIV MINNESOTA,DEPT ELECT ENGN,MINNEAPOLIS,MN 55455

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1986年 / 22卷 / 05期

关键词：

MAGNETIC MATERIALS - Stresses;

D O I：

10.1109/TMAG.1986.1064581

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

CoCr-doped gamma - Fe//2 O//3 thin films prepared by RF sputtering and annealing processes exhibit stress-induced perpendicular magnetic anisotropy. The stress is found to be caused by both the ion bombardment on the film surface during sputter-deposition and the lattice misfit between the film and the substrate. Thermal effects play a less important role in causing stress in the films examined in this study.

引用

页码：594 / 596

页数：3

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