DOPING OF MICROCRYSTALLINE SI-H,CL FILMS IN RF GLOW-DISCHARGE

被引：11
|
作者：
BRUNO, G
CAPEZZUTO, P
CRAMAROSSA, F
BARBAROSSA, V
AUGELLI, V
MURRI, R
机构：
[1] UNIV BARI,CNR,CTR STUDIO CHIM PLASMI,I-70126 BARI,ITALY
[2] UNIV BARI,DEPARTIMENTO FIS,I-70126 BARI,ITALY
[3] UNIV BARI,GRP NAZL STRUTTURA MAT,I-70126 BARI,ITALY
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 1983年 / 59-6卷 / DEC期
关键词：
D O I：
10.1016/0022-3093(83)90295-8
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：815 / 818
页数：4
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