EMISSION-SPECTROSCOPY OF GLOW-DISCHARGE AND SPUTTERING PLASMAS USED IN AMORPHOUS SI-H FILM DEPOSITION

The optical emission spectra of glow discharge (g. d. ) plasmas is analyzed, and evidence is found for Si-H complexes. From a similar analysis of sputtering plasmas, it is found that a significant silicon-hydrogen gas phase reaction does not occur. The dissimilarities of the plasmas out of which g. d. and sputtered films are condensed coupled with the similarities of the films themselves indicates that the properties of amorphous Si:H films are determined by structure that is locked into the growing film surfaces.