EQUIPMENT FOR CHEMICAL VAPOR-DEPOSITION OF SEMICONDUCTING TIN OXIDE-FILMS ON CYLINDRICAL OBJECTS

被引：0
|
作者：
JANI, VA [1 ]
RAMANUJAM, MA [1 ]
GHARE, DB [1 ]
机构：
[1] INDIAN INST SCI,DEPT HIGH VOLTAGE ENGN,BANGALORE 560012,INDIA
来源：
INDIAN JOURNAL OF TECHNOLOGY | 1976年 / 14卷 / 05期
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：231 / 233
页数：3
相关论文
共 50 条
  • [31] CHEMICAL VAPOR-DEPOSITION OF ALXOYNZ FILMS
    SILVESTR.VJ
    IRENE, EA
    ZIRINSKY, S
    KUPTSIS, JD
    JOURNAL OF ELECTRONIC MATERIALS, 1974, 3 (04) : 859 - 859
  • [32] CHEMICAL VAPOR-DEPOSITION OF ALXOYNZ FILMS
    SILVESTRI, VJ
    IRENE, EA
    ZIRINSKY, S
    KUPTSIS, JD
    JOURNAL OF ELECTRONIC MATERIALS, 1975, 4 (03) : 429 - 444
  • [33] CHEMICAL VAPOR-DEPOSITION OF OSMIUM FILMS
    LEHWALD, S
    WAGNER, H
    THIN SOLID FILMS, 1974, 21 (02) : S23 - S26
  • [34] GAS-PHASE DIAGNOSTICS AND MODELING OF TIN OXIDE CHEMICAL VAPOR-DEPOSITION
    BORMAN, CG
    BIENSTOCK, S
    ZAWADZKI, A
    GORDON, RG
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (08) : C328 - C328
  • [35] KINETIC MODELING OF THE CHEMICAL VAPOR-DEPOSITION OF TIN OXIDE FROM TETRAMETHYLTIN AND OXYGEN
    GIUNTA, CJ
    ZAWADZKI, AG
    GORDON, RG
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1990, 200 : 159 - COLL
  • [36] KINETIC MODELING OF THE CHEMICAL VAPOR-DEPOSITION OF TIN OXIDE FROM TETRAMETHYLTIN AND OXYGEN
    ZAWADZKI, AG
    GIUNTA, CJ
    GORDON, RG
    JOURNAL OF PHYSICAL CHEMISTRY, 1992, 96 (13): : 5364 - 5379
  • [37] REACTION-MECHANISMS OF PLASMA-ASSISTED AND THERMAL-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TETRAETHYLORTHOSILICATE OXIDE-FILMS
    NGUYEN, S
    DOBUZINSKY, D
    HARMON, D
    GLEASON, R
    FRIDMANN, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (07) : 2209 - 2215
  • [38] APPLICATION OF PENTA-DI-METHYL-AMINO-TANTALUM TO A TANTALUM SOURCE IN CHEMICAL VAPOR-DEPOSITION OF TANTALUM OXIDE-FILMS
    TABUCHI, T
    SAWADO, Y
    UEMATSU, K
    KOSHIBA, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1991, 30 (11B): : L1974 - L1977
  • [39] CHEMICAL VAPOR-DEPOSITION OF OXIDE AND METAL-FILMS FOR VLSI APPLICATIONS
    HIEBER, K
    KORNER, H
    TREICHEL, H
    THIN SOLID FILMS, 1989, 181 : 75 - 84
  • [40] CHEMICAL VAPOR-DEPOSITION OF VANADIUM-OXIDE THIN-FILMS
    SIEFERING, KL
    GRIFFIN, GL
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (03) : 897 - 898
12345