NEW APPROACH TO MEASUREMENT OF SLIT WIDTH

被引:0
|
作者
BROCHU, M [1 ]
DELISLE, C [1 ]
机构
[1] UNIV LAVAL,FAC SCI & GENIE,DEPT PHYS,RECH OPTIQUE & LASER LAB,LAVAL G1K 7P4,QUEBEC,CANADA
关键词
D O I
10.1139/p76-179
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:1518 / 1526
页数:9
相关论文
共 50 条
  • [41] Effect of slit width on surface plasmon resonance
    Wang, Yingying
    Qin, Feng
    Yi, Zao
    Chen, Xifang
    Zhou, Zigang
    Yang, Hua
    Liao, Xu
    Tang, Yongjian
    Yao, Weitang
    Yi, Yougen
    RESULTS IN PHYSICS, 2019, 15
  • [42] Optimization of slit width on shutter for aerial camera
    Changchun Institute of Optics Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
    不详
    不详
    Guangxue Jingmi Gongcheng, 2009, 1 (196-201):
  • [43] Co-occurrence based assessment of habitat generalists and specialists: a new approach for the measurement of niche width
    Fridley, Jason D.
    Vandermast, David B.
    Kuppinger, Dane M.
    Manthey, Michael
    Peet, Robert K.
    JOURNAL OF ECOLOGY, 2007, 95 (04) : 707 - 722
  • [44] New measurement of the Hoyle state radiative transition width
    Rana, T. K.
    Pandit, Deepak
    Manna, S.
    Kundu, Samir
    Banerjee, K.
    Sen, A.
    Pandey, R.
    Mukherjee, G.
    Ghosh, T. K.
    Nayak, S. S.
    Shil, R.
    Karmakar, P.
    Atreya, K.
    Rani, K.
    Paul, D.
    Santra, R.
    Sultana, A.
    Basu, S.
    Pal, S.
    Sadhukhan, S.
    Mondal, Debasish
    Mukhopadhyay, S.
    Bhattacharya, Srijit
    Pal, Surajit
    Pant, P.
    Roy, Pratap
    Ali, Sk M.
    Mondal, S.
    De, A.
    De, Balaram
    Datta, R.
    Bhattacharya, S.
    Bhattacharya, C.
    PHYSICS LETTERS B, 2024, 859
  • [45] Measurement and modeling of a new width dependence of NMOSFET degradation
    Schuler, F.
    Kowarik, O.
    Keitel-Schulz, D.
    Microelectronics Reliability, 1996, 36 (11-12): : 1675 - 1678
  • [46] Measurement and modeling of a new width dependence of NMOSFET degradation
    Schuler, F
    Kowarik, O
    KeitelSchulz, D
    MICROELECTRONICS AND RELIABILITY, 1996, 36 (11-12): : 1675 - 1678
  • [47] Heavily Doped Junctionless Vertical Slit FETs with Slit Width Below 20 nm
    Barbut, Lucian
    Jazaeri, Farzan
    Bouvet, Didier
    Sallese, Jean-Michel
    MIXED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS, MIXDES 2013, 2013, : 397 - 400
  • [48] Diffraction into propagating and evanescent modes from a single slit: the slit-width dependence
    Kihm, H. W.
    Lee, K. G.
    Kim, D. S.
    2007 PACIFIC RIM CONFERENCE ON LASERS AND ELECTRO-OPTICS, VOLS 1-4, 2007, : 1436 - 1437
  • [49] USES OF RETARDATION PLATES IN SPECTROPHOTOMETRY .1. DETERMINATION OF SLIT SHAPE AND SLIT WIDTH
    BUC, GL
    STEARNS, EI
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1945, 35 (07) : 458 - 464
  • [50] Analytical solutions for the principal maxima in multiple slit di ffraction: Effects of slit width
    Noh, Heung-Ryoul
    OPTIK, 2020, 208