Measurement and modeling of a new width dependence of NMOSFET degradation

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作者：
Schuler, F. [1 ]
Kowarik, O. [1 ]
Keitel-Schulz, D. [1 ]
机构：
[1] Univ of Bundeswehr Munich, Neubiberg, Germany
来源：
Microelectronics Reliability | 1996年 / 36卷 / 11-12期
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页码：1675 / 1678
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