DAMAGE CAUSED BY RF OXYGEN PLASMA ASHER

被引：4
|
作者：
SAMUKAWA, S
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1989年 / 28卷 / 08期
关键词：
D O I：
10.1143/JJAP.28.L1467
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L1467 / L1469
页数：3
相关论文
共 50 条
  • [21] Effect of oxygen rf-plasma on electronic properties of CNTs
    Felten, Alexandre
    Ghijsen, Jacques
    Pireaux, Jean-Jacques
    Johnson, Robert L.
    Whelan, Caroline M.
    Liang, Duoduo
    Van Tendeloo, Gustaaf
    Bittencourt, Carla
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2007, 40 (23) : 7379 - 7382
  • [22] Copper oxides formation by a low pressure RF oxygen plasma
    Universite de Rouen, Mont Saint Aignan, France
    Materials science & engineering. B, Solid-state materials for advanced technology, 1996, B41 (02): : 206 - 216
  • [23] Copper oxides formation by a low pressure RF oxygen plasma
    Bellakhal, N
    Draou, K
    Cheron, BG
    Brisset, JL
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1996, 41 (02): : 206 - 216
  • [24] JOSEPHSON TUNNELING BARRIERS BY RF SPUTTER ETCHING IN AN OXYGEN PLASMA
    GREINER, HJ
    JOURNAL OF APPLIED PHYSICS, 1971, 42 (12) : 5151 - &
  • [25] SELECTIVE OXIDATION OF SILICON IN RF-INDUCED OXYGEN PLASMA
    VU, HQ
    SUGANO, T
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (11) : 1830 - 1830
  • [26] Cold RF oxygen plasma treatment of graphene oxide films
    El-Hossary, F. M.
    Ghitas, Ahmed
    Abd El-Rahman, A. M.
    Ebnalwaled, A. A.
    Shahat, M. Abdelhamid
    Fawey, Mohammed H.
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2021, 32 (12) : 15718 - 15731
  • [27] Treatment of protein using oxygen plasma produced by RF discharge
    Hayashi, Nobuya
    Yagyu, Yoshihito
    TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 33, NO 3, 2008, 33 (03): : 791 - 794
  • [28] Improved RF plasma jet generation of singlet delta oxygen
    Schmiedberger, J
    Takahashi, S
    Fujii, H
    XI INTERNATIONAL SYMPOSIUM ON GAS FLOW AND CHEMICAL LASERS AND HIGH-POWER LASER CONFERENCE, 1997, 3092 : 694 - 697
  • [29] Cold RF oxygen plasma treatment of graphene oxide films
    F. M. El-Hossary
    Ahmed Ghitas
    A. M. Abd El-Rahman
    A. A. Ebnalwaled
    M. Abdelhamid Shahat
    Mohammed H. Fawey
    Journal of Materials Science: Materials in Electronics, 2021, 32 : 15718 - 15731
  • [30] Experiment on removing hydrocarbon by using RF oxygen or hydrogen plasma
    Tada, S
    Sakamoto, Y
    Suzuki, T
    Saito, H
    Oikawa, M
    Kidokoro, A
    Enoki, H
    VACUUM, 1999, 53 (1-2) : 321 - 324
12345