Copper oxides formation by a low pressure RF oxygen plasma

被引：0
|
作者：
Universite de Rouen, Mont Saint Aignan, France [1 ]
机构：
来源：
Materials science & engineering. B, Solid-state materials for advanced technology | 1996年 / B41卷 / 02期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：206 / 216
相关论文
共 50 条
  • [1] Copper oxides formation by a low pressure RF oxygen plasma
    Bellakhal, N
    Draou, K
    Cheron, BG
    Brisset, JL
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1996, 41 (02): : 206 - 216
  • [2] Nanoparticle formation in a low pressure argon/aniline RF plasma
    Pattyn, C.
    Kovacevic, E.
    Hussain, S.
    Dias, A.
    Lecas, T.
    Berndt, J.
    APPLIED PHYSICS LETTERS, 2018, 112 (01)
  • [3] Oxygen plasma generated copper/copper oxides nanoparticles
    Hu, WP
    Matsumura, M
    Furukawa, K
    Torimitsu, K
    JOURNAL OF PHYSICAL CHEMISTRY B, 2004, 108 (35): : 13116 - 13118
  • [4] Optical characterization of copper oxides formed by oxygen plasma
    Bellakhal, N
    Draou, K
    Brisset, JL
    Lenglet, M
    ANALYTICAL COMMUNICATIONS, 1996, 33 (02): : 69 - 70
  • [5] Scaling characteristics of plasma parameters for low-pressure oxygen RF discharge plasmas
    Chung, TH
    Seo, DC
    Kim, GH
    Kim, JS
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2001, 29 (06) : 970 - 973
  • [6] SELF-CONSISTENT MODELING OF LOW-PRESSURE RF DISCHARGES IN OXYGEN PLASMA
    FEOKTISTOV, VA
    MUKHOVATOVA, AV
    POPOV, AM
    RAKHIMOVA, TV
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1995, 28 (07) : 1346 - 1353
  • [7] Simulation of RF plasma flowing at low pressure
    Zheltukhin V.S.
    Shemakhin A.Y.
    Mathematical Models and Computer Simulations, 2014, 6 (1) : 101 - 107
  • [8] Characterization of low pressure RF plasma heating
    Pan, WX
    Lu, FX
    Yoshida, T
    JOURNAL OF UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING, 1998, 5 (01): : 31 - 35
  • [9] Characterization of Low Pressure RF Plasma Heating
    Wenxia Pan
    Fanxiu Lu
    Toyonobu Yoshida (Materials Science and Engineering School
    Journal of University of Science and Technology Beijing(English Edition), 1998, (01) : 31 - 35
  • [10] Laser ablation of ceramic oxides in the presence of a RF pulsed oxygen plasma
    Cantoro, A
    Coppedè, N
    Camposeo, A
    Cervelli, E
    Fuso, E
    Allegrini, A
    Arimondo, E
    SURFACE & COATINGS TECHNOLOGY, 2004, 180 : 591 - 595
12345