FERROMAGNETIC-RESONANCE IN ULTRATHIN NI(111)/W(110)

被引：12
|
作者：
LI, Y
FARLE, M
BABERSCHKE, K
机构：
[1] Institut für Experimentalphysik, Freie Universität Berlin, W-1000 Berlin 33
来源：
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1991年 / 93卷
关键词：
D O I：
10.1016/0304-8853(91)90359-I
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
20, 25 and 30 angstrom thin Ni(111) films have been prepared on W(110) in UHV and characterized by low energy electron diffraction and Auger spectroscopy. FMR measurements at 9 GHz have been used to study the magnetic properties between 300 and 600 K. The effective in and out of plane anisotropies increase with decreasing temperature and film thickness. These anisotropies are decomposed into surface (K(s)) and volume (K(v)) contributions. K(v) is 30 times larger than in bulk Ni, due to internal stress caused by the lattice mismatch between Ni and W.
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页码：345 / 348
页数：4
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