FERROMAGNETIC-RESONANCE IN ULTRATHIN NI(111)/W(110)

20, 25 and 30 angstrom thin Ni(111) films have been prepared on W(110) in UHV and characterized by low energy electron diffraction and Auger spectroscopy. FMR measurements at 9 GHz have been used to study the magnetic properties between 300 and 600 K. The effective in and out of plane anisotropies increase with decreasing temperature and film thickness. These anisotropies are decomposed into surface (K(s)) and volume (K(v)) contributions. K(v) is 30 times larger than in bulk Ni, due to internal stress caused by the lattice mismatch between Ni and W.