BASIC PROPERTIES OF PLASMA-DEPOSITED MU-C-SI

被引：0
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作者：
TANAKA, K
MATSUDA, A
机构：
来源：
JAPAN ANNUAL REVIEWS IN ELECTRONICS COMPUTERS & TELECOMMUNICATIONS | 1983年 / 6卷
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中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
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页码：161 / 172
页数：12
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