DENSIFICATION OF PYROLYTIC SILICON DIOXIDE FILMS

被引：0
|
作者：
PLISKIN, WA
LEHMAN, HS
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1964年 / 111卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C62 / C62
页数：1
相关论文
共 50 条
  • [41] Interfacial adhesion and friction of pyrolytic carbon thin films on silicon substrates
    N. Deyneka-Dupriez
    U. Herr
    H-J. Fecht
    A. Pfrang
    Th. Schimmel
    B. Reznik
    D. Gerthsen
    Journal of Materials Research, 2008, 23 : 2749 - 2756
  • [42] DIFFUSION OF NICKEL IN AMORPHOUS SILICON DIOXIDE AND SILICON NITRIDE FILMS
    GHOSHTAGORE, RN
    JOURNAL OF APPLIED PHYSICS, 1969, 40 (11) : 4374 - +
  • [43] PROPERTIES OF SILICON DIOXIDE FILMS ON SILICON AS DIFFUSION MASKS FOR BORON
    ANAND, KV
    MCKELL, HD
    NORTHROP, DC
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1971, 4 (11) : 1722 - &
  • [44] PLASMA DEPOSITION OF SILICON DIOXIDE AND SILICON-NITRIDE FILMS
    VANDEVEN, EPGT
    SOLID STATE TECHNOLOGY, 1981, 24 (04) : 167 - 171
  • [45] Surface plasmons and breakdown in thin silicon dioxide films on silicon
    Kim, JH
    Sanchez, JJ
    DeMassa, TA
    Quddus, MT
    Smith, D
    Shaapur, F
    Weiss, K
    Liu, CH
    JOURNAL OF APPLIED PHYSICS, 1998, 84 (03) : 1430 - 1438
  • [46] HEXACHLORODISILANE AS A PRECURSOR IN THE LPCVD OF SILICON DIOXIDE AND SILICON OXYNITRIDE FILMS
    TAYLOR, RC
    SCOTT, BA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (08) : 2382 - 2386
  • [47] Interfacial adhesion and friction of pyrolytic carbon thin films on silicon substrates
    Deyneka-Dupriez, N.
    Herr, U.
    Fecht, H-J.
    Pfrang, A.
    Schimmel, Th.
    Reznik, B.
    Gerthsen, D.
    JOURNAL OF MATERIALS RESEARCH, 2008, 23 (10) : 2749 - 2756
  • [48] REFLECTIVITY THICKNESS CORRECTIONS FOR SILICON DIOXIDE FILMS ON SILICON FOR VAMFO
    PLISKIN, WA
    WESSON, RA
    IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1968, 12 (02) : 192 - &
  • [49] LATERAL EPITAXIAL RECRYSTALLIZATION OF DEPOSITED SILICON FILMS ON SILICON DIOXIDE
    KAMINS, TI
    CASS, TR
    DELLOCA, CJ
    LEE, KF
    PEASE, RFW
    GIBBONS, JF
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (05) : 1151 - 1154
  • [50] DENSIFICATION OF PLASMA DEPOSITED SILICON-NITRIDE FILMS BY HYDROGEN DILUTION
    ROCHELEAU, RE
    ZHANG, Z
    THIN SOLID FILMS, 1992, 220 (1-2) : 73 - 79
12345