DENSIFICATION OF PYROLYTIC SILICON DIOXIDE FILMS

被引:0
|
作者
PLISKIN, WA
LEHMAN, HS
机构
关键词
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:C62 / C62
页数:1
相关论文
共 50 条
  • [21] STUDIES OF THE DIFFUSION OF GOLD INTO SILICON AND SILICON DIOXIDE FILMS
    ADAMIC, JW
    MCNAMARA, JE
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (08) : C187 - C187
  • [22] FILMS OF SILICON NITRIDE-SILICON DIOXIDE MIXTURES
    CHU, TL
    SZEDON, JR
    LEE, CH
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (03) : 318 - &
  • [23] DIFFUSION OF GALLIUM THROUGH SILICON DIOXIDE FILMS INTO SILICON
    WAGNER, S
    POVILONIS, EI
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (11) : 1487 - 1496
  • [24] MEASUREMENTS AND MODELING OF THIN SILICON DIOXIDE FILMS ON SILICON
    KALNITSKY, A
    TAY, SP
    ELLUL, JP
    CHONGSAWANGVIROD, S
    ANDREWS, JW
    IRENE, EA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (01) : 234 - 238
  • [25] Surface roughness of pyrolytic tin dioxide films evaluated by different methods
    Niklasson, GA
    Rönnow, D
    Mattsson, MS
    Kullman, L
    Nilsson, H
    Roos, A
    THIN SOLID FILMS, 2000, 359 (02) : 203 - 209
  • [26] Photoassisted etching of silicon dioxide films
    Gudymovich, E. N.
    Vanifat'eva, E. Yu.
    HIGH ENERGY CHEMISTRY, 2009, 43 (04) : 298 - 302
  • [27] PREPARATION + PROPERTIES OF SILICON DIOXIDE FILMS
    FLEMING, TC
    VACUUM, 1964, 14 (03) : 121 - &
  • [28] REACTIVELY SPUTTERED SILICON DIOXIDE FILMS
    VALLETTA, RM
    PERRI, JA
    RISEMAN, J
    ELECTROCHEMICAL TECHNOLOGY, 1966, 4 (7-8): : 402 - &
  • [29] Photoassisted etching of silicon dioxide films
    E. N. Gudymovich
    E. Yu. Vanifat’eva
    High Energy Chemistry, 2009, 43 : 298 - 302
  • [30] THERMAL NITRIDATION OF SILICON DIOXIDE FILMS
    MENENDEZ, I
    FERNANDEZ, M
    SACEDON, JL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 45 - 47