DENSIFICATION OF PYROLYTIC SILICON DIOXIDE FILMS

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作者：

PLISKIN, WA

LEHMAN, HS

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1964年 / 111卷 / 03期

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O646 [电化学、电解、磁化学];

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081704 ;

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页码：C62 / C62

页数：1

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