PROPERTIES OF AL2O3 THIN-FILMS PREPARED BY ION-ASSISTED EVAPORATION

被引：8
|
作者：
KUBLER, W
机构：
[1] Institut für Technologie der Elektrotechnik, Universität Karlsruhe, 7500 Karlsruhe
来源：
THIN SOLID FILMS | 1991年 / 199卷 / 02期
关键词：
D O I：
10.1016/0040-6090(91)90007-K
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Al2O3 films were produced by bombardment with oxygen ions during evaporation in a conventional electron beam evaporation system. Contrary to films produced without ion bombardment but otherwise identical parameters, these Al2O3 films exhibited considerably improved dielectric properties. The improvements can be explained by a significantly increased homogeneity and a raised density of the Al2O3 films.
引用
收藏
页码：247 / 257
页数：11
相关论文
共 50 条
  • [41] Optical and structural properties of silicon nitride thin films prepared by ion-assisted deposition
    Ku, Shih-Liang
    Lee, Cheng-Chung
    OPTICAL MATERIALS, 2010, 32 (09) : 956 - 960
  • [42] PROPERTIES OF ZNO THIN-FILMS PREPARED BY LASER EVAPORATION
    SANKUR, H
    MOTAMEDI, ME
    IEEE TRANSACTIONS ON SONICS AND ULTRASONICS, 1985, 32 (01): : 117 - 118
  • [43] Growth and properties of thin Al2O3 films
    Mittov, O.N.
    Sysoev, B.I.
    Bezryadin, M.N.
    Linnik, V.D.
    Poverkhnost Fizika Khimiya Mekhanika, 1992, (10-11):
  • [44] Studies on optical and dielectric properties of Al2O3 thin films prepared by electron beam evaporation and spray pyrolysis method
    Shamala, KS
    Murthy, LCS
    Rao, KN
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2004, 106 (03): : 269 - 274
  • [45] CONDUCTION PROPERTIES OF THIN AL2O3 FILMS
    ARYA, SPS
    SINGH, HP
    THIN SOLID FILMS, 1982, 91 (04) : 363 - 374
  • [46] UNBALANCED MAGNETRON ION-ASSISTED DEPOSITION AND PROPERTY MODIFICATION OF THIN-FILMS
    SAVVIDES, N
    WINDOW, B
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 504 - 508
  • [47] OPTICAL-PROPERTIES OF CDS MICROCRYSTALLITE-DOPED AL2O3 THIN-FILMS PREPARED BY RF-SPUTTERING
    TANAHASHI, I
    YOSHIDA, M
    MITSUYU, T
    BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 1991, 64 (07) : 2281 - 2283
  • [48] OPTIMIZATION OF DEPOSITION PARAMETERS IN ION-ASSISTED DEPOSITION OF OPTICAL THIN-FILMS
    MARTIN, PJ
    NETTERFIELD, RP
    THIN SOLID FILMS, 1991, 199 (02) : 351 - 358
  • [49] INSITU STRESS MEASUREMENTS OF ION-ASSISTED MGF2 AND SIOX THIN-FILMS
    MARTIN, PJ
    NETTERFIELD, RP
    KINDER, TJ
    STAMBOULI, V
    APPLIED PHYSICS LETTERS, 1991, 58 (22) : 2497 - 2499
  • [50] Characterization of Al2O3 thin films prepared by thermal ALD
    Barbos, Corina
    Blanc-Pelissier, Daniele
    Fave, Alain
    Blanquet, Elisabeth
    Crisci, Alexandre
    Fourmond, Erwann
    Albertini, David
    Sabac, Andrei
    Ayadi, Khaled
    Girard, Philippe
    Lemiti, Mustapha
    5TH INTERNATIONAL CONFERENCE ON SILICON PHOTOVOLTAICS, SILICONPV 2015, 2015, 77 : 558 - 564
12345