SILICON SELF-INTERSTITIAL MIGRATION - MULTIPLE PATHS AND CHARGE STATES

被引:66
作者
BARYAM, Y
JOANNOPOULOS, JD
机构
来源
PHYSICAL REVIEW B | 1984年 / 30卷 / 04期
关键词
D O I
10.1103/PhysRevB.30.2216
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:2216 / 2218
页数:3
相关论文
共 11 条
[1]   THEORY OF THE SILICON VACANCY - AN ANDERSON NEGATIVE-U SYSTEM [J].
BARAFF, GA ;
KANE, EO ;
SCHLUTER, M .
PHYSICAL REVIEW B, 1980, 21 (12) :5662-5686
[2]  
BARAFF GA, UNPUB
[3]   BARRIER TO MIGRATION OF THE SILICON SELF-INTERSTITIAL [J].
BARYAM, Y ;
JOANNOPOULOS, JD .
PHYSICAL REVIEW LETTERS, 1984, 52 (13) :1129-1132
[4]   ELECTRONIC-STRUCTURE AND TOTAL-ENERGY MIGRATION BARRIERS OF SILICON SELF-INTERSTITIALS [J].
BARYAM, Y ;
JOANNOPOULOS, JD .
PHYSICAL REVIEW B, 1984, 30 (04) :1844-1852
[5]  
BARYAM Y, UNPUB
[6]   MICROSCOPIC THEORY OF ATOMIC DIFFUSION MECHANISMS IN SILICON [J].
CAR, R ;
KELLY, PJ ;
OSHIYAMA, A ;
PANTELIDES, ST .
PHYSICAL REVIEW LETTERS, 1984, 52 (20) :1814-1817
[7]  
FRANK W, DIFFUSION SOLIDS, V2
[8]   NATURE AND DIFFUSION OF THE SELF-INTERSTITIAL IN SILICON [J].
MASRI, P ;
HARKER, AH ;
STONEHAM, AM .
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1983, 16 (18) :L613-L616
[9]  
Tan S. I., 1973, ION IMPLANTATION SEM, P19
[10]  
Watkins G.D., 1975, LATTICE DEFECTS SEMI, V23, P1