Comparison of Thin Films of Titanium Dioxide Deposited by Sputtering and Sol–Gel Methods for Waveguiding Applications

被引：0
|
作者：
M. Brella
A. Taabouche
B. Gharbi
R. Gheriani
Y. Bouachiba
A. Bouabellou
H. Serrar
S. Touil
K. Laggoune
M. Boudissa
机构：
[1] Laboratoire de Rayonnement et Plasmas et Physique des Surfaces (LRPPS),
[2] Université Kasdi Merbah,undefined
[3] Thin Films and Interfaces Laboratory,undefined
[4] University of Fréres Mentouri Constantine,undefined
[5] Faculty of Hydrocarbons and Renewable Energies and Earth and Universe Sciences,undefined
[6] University Kasdi Merbah,undefined
[7] Laboratoire Technologie des Matériaux Avancés,undefined
[8] Ecole Nationale Polytechnique de Constantine Malek BENNABI,undefined
[9] Research Center in Industrial Technologies (CRTI),undefined
[10] ENMC Laboratory,undefined
[11] Department of Physics,undefined
[12] Faculty of Sciences,undefined
[13] University Ferhat Abbas,undefined
来源：
Semiconductors | 2022年 / 56卷
关键词：
TiO; thin films; sol–gel; sputtering; anatase; waveguiding;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：234 / 239
页数：5
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