Morphological and Electrochemical Study of Sulfide/Nitride Nanostructure Deposited Through Pulsed Plasma Electrolysis

被引:0
|
作者
H. Tavakoli
M. Sobhani
机构
[1] Semnan University,Faculty of Materials and Metallurgical Engineering
关键词
impedance spectroscopy; nanostructure; pulsed plasma electrolysis; sulfide/nitride layer; wear;
D O I
暂无
中图分类号
学科分类号
摘要
This study investigated the feasibility of coating a steel St12 substrate with a sulfide/nitride layer. The coating process was conducted through a plasma electrolysis technique with a pulsed regime applied at frequencies of 100, 500, and 1000 Hz. It was found that the use of higher frequencies in the mentioned process provides better control over workpiece surface temperature and leads to reduced extent of voltage variations required to achieve a fixed temperature. The coating deposited at the frequency of 1000 Hz and voltage of about 235 V exhibited a nanostructure composed of 50 nm particles. The deposited coating consisted of an outer porous layer and an inner relatively dense layer. The x-ray studies identified the phases of the coating as γ′-Fe4N, Fe2-3N and FeS. The presence of FeS phase reduces the friction coefficient of the surface to about half the value obtainable in its absence. Studying the electrochemical impedance of the layer revealed that using a higher frequency in the deposition process increases the stability of resulting layer against seven days of immersion in the corrosive solution.
引用
收藏
页码:1657 / 1663
页数:6
相关论文
共 50 条
  • [41] Amorphous silicon nitride films of different composition deposited at room temperature by pulsed glow discharge plasma immersion ion implantation and deposition
    Afanasyev-Charkin, IV
    Jacobsohn, LG
    Averitt, RD
    Nastasi, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2004, 22 (06): : 2342 - 2346
  • [42] Effect of plasma process parameters on the wear behavior of High-Power Pulsed Magnetron Sputtering deposited Aluminum Titanium Nitride coatings
    Naveed, Muhammad
    Qadir, Awais
    OPEN CERAMICS, 2025, 21
  • [43] Study of bipolar pulsed plasma electrolytic carbonitriding on nanostructure of compound layer for a gamma Ti-Al alloy
    Aliofkhazraei M.
    Rouhaghdam A.S.
    Roohzendeh M.
    Frontiers of Materials Science in China, 2008, 2 (1): : 48 - 54
  • [44] POSITRON STUDY OF PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITED SILICON-NITRIDE FILMS
    LANDHEER, D
    AERS, GC
    SPROULE, GI
    KHATRI, R
    SIMPSON, PJ
    GUJRATHI, SC
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (04) : 2568 - 2574
  • [45] Role of ion energy flux on the structural and morphological properties of silicon oxy-nitride composite films deposited by plasma focus device
    Khan, Ijaz Ahmad
    Hussain, Syed Anwaar
    Farid, Amjad
    Hussnain, Ali
    Umar, Zeshan Adeel
    Rawat, Rajdeep Singh
    Ahmad, Riaz
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 2018, 173 (11-12): : 929 - 943
  • [46] Study on the microstructure and properties of (Ti,Al)N film deposited by pulsed high energy density plasma
    Liu, Yuan-Fu
    Han, Jian-Min
    Zhang, Gu-Ling
    Wang, Jiu-Li
    Chen, Guang-Liang
    Li, Xue-Ming
    Feng, Wen-Ran
    Fan, Song-Hua
    Liu, Chi-Zi
    Yang, Si-Ze
    Wuli Xuebao/Acta Physica Sinica, 2005, 54 (03): : 1301 - 1305
  • [47] Study on the microstructure and properties of (Ti, Al) N film deposited by pulsed high energy density plasma
    Liu, YF
    Han, JM
    Zhang, GL
    Wang, JL
    Chen, GL
    Li, XM
    Feng, WR
    Fan, SH
    Liu, CZ
    Yang, SZ
    ACTA PHYSICA SINICA, 2005, 54 (03) : 1301 - 1305
  • [48] Structural study of device quality silicon germanium thin films deposited by pulsed RF plasma CVD
    Chaudhuri, Partha
    Bhaduri, Ayana
    Bandyopadhyay, Atul
    Williamson, D. L.
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2009, 93 (6-7) : 1016 - 1019
  • [49] Study of titanium nitride film growth by plasma enhanced pulsed laser deposition at different experimental conditions
    Escalona, M.
    Bhuyan, H.
    Ibacache, S.
    Retamal, M. J.
    Saikia, P.
    Borgohain, C.
    Valenzuela, J. C.
    Veloso, F.
    Favre, M.
    Wyndham, E.
    SURFACE & COATINGS TECHNOLOGY, 2021, 405
  • [50] Fe(Se,Te) Thin Films Deposited through Pulsed Laser Ablation from Spark Plasma Sintered Targets
    Iebole, Michela
    Braccini, Valeria
    Bernini, Cristina
    Malagoli, Andrea
    Manca, Nicola
    Martinelli, Alberto
    Cialone, Matteo
    Putti, Marina
    Singh, Shiv J.
    Latronico, Giovanna
    Mele, Paolo
    MATERIALS, 2024, 17 (11)