Etching of wood surfaces by glow discharge plasma

被引:0
|
作者
A. Jamali
P. D. Evans
机构
[1] University of British Columbia,Centre for Advanced Wood Processing
来源
关键词
Plasma Treatment; Plasma Etching; Middle Lamella; Cell Wall Material; Wood Cell Wall;
D O I
暂无
中图分类号
学科分类号
摘要
This research tests the hypothesis that plasma will cause differential etching of wood cell walls because of variation in the susceptibility of aromatic and aliphatic polymers to degradation by plasma. Wood was exposed to glow discharge plasma, and scanning electron microscopy and chromatic confocal profilometry were used to examine etching of cell walls. Plasma etched cell walls and made them thinner, but the middle lamella was more resistant to etching than the secondary wall. Plasma created small voids within the secondary wall, which were separated by thin lamellae connected to the middle lamella and tertiary wall layers. Larger voids were created in cell walls by the etching of bordered and half-bordered pits. Etching of the uppermost layer of cells at wood surfaces occurs first and when large voids are created in the walls of these cells then significant plasma etching of the underlying cells occurs. Etching of wood cell walls can be quantified using confocal profilometry, and using this technique a strong relationship between applied plasma energy and volume of cell wall etched by plasma was observed. It is concluded that all of wood’s polymers can be degraded by plasma even though cell wall layers that are rich in lignin are etched more slowly than other parts of the cell wall.
引用
收藏
页码:169 / 182
页数:13
相关论文
共 50 条
  • [21] DECONTAMINATION OF METAL SURFACES IN GLOW DISCHARGE
    GENGRINOVICH, VA
    TOLKACHEV, VE
    INSTRUMENTS AND EXPERIMENTAL TECHNIQUES-USSR, 1970, (05): : 1428 - +
  • [22] MAGNETIC FIELD ENHANCED PLASMA ETCHING AND GLOW POLYMERIZATION AT A LOW-FREQUENCY DISCHARGE.
    Schlemm, Hermann
    Matthes, Michael
    Wissenschaftliche Zeitschrift - Technische Hochschule Karl-Marx-Stadt, 1986, 28 (02): : 219 - 224
  • [23] Creation of superhydrophobic wood surfaces by plasma etching and thin-film deposition
    Xie, Linkun
    Tang, Zhenguan
    Jiang, Lu
    Breedveld, Victor
    Hess, Dennis W.
    SURFACE & COATINGS TECHNOLOGY, 2015, 281 : 125 - 132
  • [24] KINETICS OF POLYMER ETCHING IN AN OXYGEN GLOW-DISCHARGE
    JURGENSEN, CW
    ACS SYMPOSIUM SERIES, 1989, 412 : 210 - 233
  • [25] ETCHING OF GALLIUM-ARSENIDE IN THE GLOW HYDROGEN DISCHARGE
    SVETTSOV, VI
    CHESNOKOVA, TA
    SADINA, IY
    IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII KHIMIYA I KHIMICHESKAYA TEKHNOLOGIYA, 1987, 30 (07): : 50 - 53
  • [26] KINETICS OF POLYMER ETCHING IN AN OXYGEN GLOW-DISCHARGE
    JURGENSEN, CW
    POLYMERS IN MICROLITHOGRAPHY: MATERIALS AND PROCESSES, 1989, 412 : 210 - 233
  • [27] Comparison of electron temperature in DC glow discharge and AC glow discharge plasma
    Tangjitsomboon, P.
    Ngamrungroj, D.
    Mongkolnavin, R.
    SIAM PHYSICS CONGRESS 2019 (SPC2019): PHYSICS BEYOND DISRUPTION SOCIETY, 2019, 1380
  • [28] Sterilization and plasma processing of room temperature surfaces with a one atmosphere uniform glow discharge plasma (OAUGDP)
    Ben Gadri, R
    Roth, JR
    Montie, TC
    Kelly-Wintenberg, K
    Tsai, PPY
    Helfritch, DJ
    Feldman, P
    Sherman, DM
    Karakaya, F
    Chen, ZY
    SURFACE & COATINGS TECHNOLOGY, 2000, 131 (1-3): : 528 - 542
  • [29] A study of heterogeneous recombination of chlorine atoms on aluminum and copper surfaces in glow discharge plasma
    Sitanov, D. V.
    Pivovarenok, S. A.
    HIGH ENERGY CHEMISTRY, 2017, 51 (04) : 292 - 296
  • [30] Room temperature sterilization of surfaces and fabrics with a One Atmosphere Uniform Glow Discharge Plasma
    Kelly-Wintenberg, K
    Montie, TC
    Brickman, C
    Roth, JR
    Carr, AK
    Sorge, K
    Wadsworth, LC
    Tsai, PPY
    JOURNAL OF INDUSTRIAL MICROBIOLOGY & BIOTECHNOLOGY, 1998, 20 (01) : 69 - 74