Spatial Wavefunction-Switched (SWS) InGaAs FETs with II–VI Gate Insulators

被引:0
|
作者
F. C. Jain
B. Miller
E. Suarez
P.-Y. Chan
S. Karmakar
F. Al-Amoody
M. Gogna
J. Chandy
E. Heller
机构
[1] University of Connecticut,Department of Electrical and Computer Engineering
[2] RSoft Design Group,undefined
来源
关键词
InGaAs MOSFETs; spatial wavefunction-switched FETs; multibit processing;
D O I
暂无
中图分类号
学科分类号
摘要
This paper presents the implementation of a novel InGaAs field-effect transistor (FET), using a ZnSe-ZnS-ZnMgS-ZnS stacked gate insulator, in a spatial wavefunction-switched (SWS) structural configuration. Unlike conventional FETs, SWS devices comprise two or more asymmetric coupled quantum wells (QWs). This feature enables carrier transfer vertically from one quantum well to another or laterally to the wells of adjacent SWS-FET devices by manipulation of the gate voltages (Vg). Observation of an extra peak (near both accumulation and inversion regions) in the capacitance–voltage data in an InGaAs-AlInAs two-quantum-well SWS structure is presented as evidence of spatial switching. The peaks are attributed to the appearance of carriers first in the lower well and subsequently their transfer to the upper well as the gate voltage is increased. The electrical characteristics of a fabricated SWS InGaAs FET are also presented along with simulations of capacitance–voltage (C–V) behavior, showing the effect of wavefunction switching between wells. Finally, logic operations involving simultaneous processing of multiple bits in a device, using coded spatial location of carriers in quantum well channels, are also described.
引用
收藏
页码:1717 / 1726
页数:9
相关论文
共 23 条
  • [21] Simulation and Comparative Study of Propagation Delay in Multi-Channel Quantum SWS-CMOS-Based Inverters Using II-VI Gate Insulator
    Almalki, A.
    Saman, B.
    Gudlavalleti, R.H.
    Chandy, J.
    Heller, E.
    Jain, F.C.
    International Journal of High Speed Electronics and Systems, 2024, 33 (2-3)
  • [22] Indium Gallium Arsenide Quantum Dot Gate Field-Effect Transistor Using II–VI Tunnel Insulators Showing Three-State Behavior
    P.-Y. Chan
    E. Suarez
    M. Gogna
    B.I. Miller
    E.K. Heller
    J.E. Ayers
    F.C. Jain
    Journal of Electronic Materials, 2012, 41 : 2810 - 2815
  • [23] Indium Gallium Arsenide Quantum Dot Gate Field-Effect Transistor Using II-VI Tunnel Insulators Showing Three-State Behavior
    Chan, P. -Y.
    Suarez, E.
    Gogna, M.
    Miller, B. I.
    Heller, E. K.
    Ayers, J. E.
    Jain, F. C.
    JOURNAL OF ELECTRONIC MATERIALS, 2012, 41 (10) : 2810 - 2815