Effect of lattice misfit on the transition temperature of VO2 thin film

被引:0
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作者
Hyun Koo
Sejin Yoon
O-Jong Kwon
Kyeong-Eun Ko
Dongmin Shin
Sung-Hwan Bae
Se-Hong Chang
Chan Park
机构
[1] Seoul National University,Department of Materials Science and Engineering
[2] Korea Electronics Technology Institute,Research Institute of Advanced Materials
[3] Seoul National University,undefined
来源
关键词
Thermal Stress; High Resolution Transmission Electron Microscope; Lattice Misfit; Vanadium Dioxide; Pulse Laser Deposition Method;
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摘要
Vanadium dioxide thin films were deposited on c-cut sapphire and MgO(111) substrate using pulsed laser deposition method to investigate the effect of lattice misfit between the thin film and the substrate on the transition temperature of VO2 thin film. All vanadium dioxide thin films showed heteroepitaxial growth with (002) preferred orientation. VO2/c-sapphire and VO2/MgO(111) had different transition temperatures, regardless of the thickness, orientation, and deposition conditions of the thin film. These results suggest that considering lattice mismatch between thin film and substrate is another promising option for controlling transition temperature of VO2 thin films.
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页码:6397 / 6401
页数:4
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