RHEED observation of BaTiO3 thin films grown by MBE

被引:9
|
作者
Yoneda, Y
Sakaue, K
Terauchi, H
机构
[1] Japan Atom Energy Res Inst, Dept Synchrotron Radiat Fac, Sayo, Hyogo 6795148, Japan
[2] Kwansei Gakuin Univ, Dept Phys, Sanda, Hyogo 6691337, Japan
关键词
reflection high-energy electron diffraction (RHEED); x-ray scattering; diffraction; and reflection; surface relaxation and reconstruction; surface structure; morphology; roughness; and topography; growth; molecular beam epitaxy;
D O I
10.1016/S0039-6028(03)00361-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Ferroelectric BaTiO3 thin films with a thickness of 10 monolayers (ML) were epitaxially grown on SrTiO3(001) substrates by very slow deposition using molecular beam epitaxy (MBE). The investigations were carried out by two growth methods: (i) codeposition and (ii) alternate deposition of the metal elements in an oxygen atmosphere. In situ observation of reflection high-energy electron diffraction confirmed that an epitaxial cube-on-cube structure was prepared. After the deposition, X-ray diffraction measurements were carried out. The 10-ML-thick BaTiO3 films were highly c-axis oriented single crystals with good film quality. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:283 / 287
页数:5
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