n-Si/SiO2/Si heterostructure barrier varactor diode design

被引:7
|
作者
Fu, Y
Mamor, M
Willander, M
Bengtsson, S
Dillner, L
机构
[1] Univ Gothenburg, Dept Phys, S-41296 Gothenburg, Sweden
[2] Chalmers Univ Technol, Dept Microelect ED, Solid State Elect Lab, S-41296 Gothenburg, Sweden
[3] Univ Gothenburg, Dept Microwave Technol, S-41296 Gothenburg, Sweden
关键词
D O I
10.1063/1.126891
中图分类号
O59 [应用物理学];
学科分类号
摘要
Symmetric C-V and antisymmetric I-V characteristics are essential for a heterostructure barrier varactor (HBV) to generate odd harmonics in a frequency multiplier. Practically high multiplier efficiency is obtained when the shape of the C-V characteristic is sharp near zero bias and the conduction current is low. Here we present the design of an n-type Si/SiO2/Si-based HBV and its state-of-the-art device performance. Self-consistent solutions of the Schrodinger and Poisson equations show a drastic decrease of the conduction current due to the large electron effective mass and the SiO2 barrier height. The shape of the C-V curve can be easily tuned by modifying the thickness of the SiO2 layer. By the techniques compatible with the conventional Si technology, a Si/SiO2/Si varactor junction (having a SiO2 layer of 20 nm) has been processed and the device characteristics are very promising. (C) 2000 American Institute of Physics. [S0003-6951(00)01827-1].
引用
收藏
页码:103 / 105
页数:3
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